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Standard

ISO 14701:2011

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Nota: Ultima versione: ISO 14701:2018

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ISO 14701:2011 specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished specimens and for instruments that incorporate an Al or Mg X-ray source, a specimen stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6° cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in the standard, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.

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  • Standard da ISO
  • Pubblicato:
  • Ritirato:
  • Periodo di opposizione fino a:
  • Edizione: 1
  • Tipo di documento: IS
  • Pagine
  • Publisher ISO
  • Distributor ISO
  • ICS 71.040.40
  • International TC ISO/TC 201/SC 7

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