Standard

ISO 22278:2020

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Abstract

This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.

Products specifications

  • Standard from ISO
  • Published:
  • Edition: 1
  • Document type: IS
  • Pages
  • Publisher: ISO
  • Distributor: ISO
  • ICS: 81.060.30
  • International TC: ISO/TC 206